Introduction

Chemical vapor deposition (CVD) is a procedure based on chemical grounds applied in the production of materials which are solid, of high quality and exhibit high performances. The common usage of this process is noticed in the industry for semiconductors in order to manufacture thin films. During a typical form of this process, the substrate, i.e., water finds exposure to volatile precursors, which can be one or more in number. On this, the precursor undergoes decomposition or reaction with the surface of the substrate which thus gives rise to the desired deposition. By-products volatile in nature are often formed and these are eradicated by a stream of gas passed across the reaction chamber.

Market for chemical vapor deposition (CVD)

The global market for chemical vapor deposition is expected to increase at a higher compound annual growth rate (CAGR) during the forecast period of 2014-2019. The ability of this technique to give off quality results has been the market driving factor for this.The immense usage of this technique in the semiconductor industry bringing a significant turnover in this sector has also added to the expansion of the market industry for chemical vapor deposition.

What are the common uses of chemical vapor deposition?

This technique is generally used in augmenting the surfaces of substrates and in depositing conformal films via processes which are not served by the conventional methods of modifying surfaces. This procedure finds vital place in the atomic layer deposition process wherein deposition of material layers which are extremely thin, takes place. These films are put into work at wide number of areas. One such example being Gallium arsenide which is applied in photovoltaic devices and integrated circuits in some cases. Wear resistance is provided by some nitrides and carbides. Of all these, polymerization involving chemical vapor deposition, encompasses the widest range of applications. This makes possible the formation of coatings extremely thin in structure along with the provision of few immensely desirable qualities which include hydrophobic nature, lubricity and resistance to weather. This process has also been extended to metal organic frameworks in recent times. The list names a number of materials which are produced by employing this procedure and stand as materials of commercial importance around the globe. These include polysilicon, silicon dioxide, silicon nitride, metals, graphene, graphene nanoribbon and diamond. Adding to this list, the process in applied for chalcogenides as well due to the importance of mercury cadmium telluride owing to the ever-growing interest for detecting infrared radiations.

Conclusion

Chemical vapor deposition (CVD) has grown as a widely used technique. Its range of applications in various sectors has driven the success of the process, adding to its market gain.

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